• Nano Mask Pattern Module-1
  • Nano Mask Pattern Module-2
  • Nano Mask Pattern Module-3
  • Nano Mask Pattern Module-4
  • Nano Mask Pattern Module-5
  • Nano Mask Pattern Module-6
  • Nano Mask Pattern Module-7
  • Nano Mask Pattern Module-8

Nano Mask Pattern Module

FEATURES


This system is used in nano mask bonding equipment, and the mask is attached to glass, wafer and other components that require high-precision positioning. The image alignment system provides initial positioning of the mask and completes image positioning and auto-focus calculate the positioning offset angle of the pattern through the offset calculation between the two points of the image, and set the compensation value to the secondary positioning of the glass to facilitate the precise affixing between the pattern and the glass.



◆ WAFER IMAGE PATTERN

◆ DUAL CCD CONTROL

◆ HIGH BRIGHTNESS LED

SIMPLE TO SETUP

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Mask Pattern

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Glass Pattern

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Rotary

 

OPTICAL PATTERN

Design the automatic alignment system equipment flow required by the mask and glass precision lamination cooperation industry,

Calculate the rotation difference between the two points through the image, and provide the position correction of the glass at the feeding end of the equipment.

Increase the yield of the mask glass.

 

99 % up

Pattern Match

100 %

Offset Fix

below 1 %

Image distortion